Deposition of Thin Films and Nanostructures

Research group at the Department of Plasma Physics and Technology

Our research group, Deposition of Thin Films and Nanostructures specializes in preparing thin films and nanomaterials using plasma. We focus on PVD (Physical Vapor Deposition) techniques with an emphasis on magnetron sputtering and HiPIMS (High-Power Impulse Magnetron Sputtering), PECVD (Plasma Enhanced Chemical Vapor Deposition) techniques, and also microwave and high-frequency methods of advanced nanomaterials preparation.

Our work includes the design of new materials and manufacturing processes, plasma deposition diagnostics, process simulation, theoretical modeling of material properties, and analysis of prepared layers and nanomaterials. We characterize the synthesized thin films and nanomaterials' composition, morphology, crystal structure, chemical bonding, electrical, optical, mechanical, and functional properties.

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Our team

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Prof. Petr Vašina

director of the Department of Plasma Physics and Technology

vasina(at)physics.muni.cz
ORCID

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Assoc. Prof. Vilma Buršíková

complex analysis of mechanical properties of thin films

vilmab(at)physics.muni.cz
ORCID

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Assoc. Prof. Pavel Souček

Research and development of new types of materials, analysis of deposition process, preparation and analysis of coatings

soucek(at)mail.muni.cz
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Assoc. Prof. Jaroslav Hnilica

Space and time resolved diagostics of plasma, study of plasma instabilities, HiPIMS

hnilica(at)mail.muni.cz
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Dr. Ondřej Jašek

Study of microwave plasma, carbon nanostructures and nanomaterials

ondrej,jasek(at)mail.muni.cz
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Dr. Peter Klein

HiPIMS plasma diagnostics using optical emission spectroscopy, high-speed cameras and probes

pklein(at)mail.muni.cz
ORCID

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Dr. Matej Fekete

Research and development of new types of materials, diagnostics of the deposition process

fekete(at)physics.muni.cz
ORCID

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Dr. Jaroslav Ženíšek

Ab-initio calculations of coating structure and properties, preparation of thin films, including amourphous metallic glass coatings

jzenisek(at)mail.muni.cz
SCOPUS

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Dr. Pavel Ondračka

Ab-initio culations of coating structure and properties, such as WBC

ondracka(at)mail.muni.cz
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Dr. Richard Gaetan Paul Drevet

Preparation and analysis of ceramic coatings

drevet(at)mail.muni.cz
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Dr. Tereza Schmidtová

Research and analysis of protectvie coatings, including amouphous metallic glass

tschmidtova(at)sci.muni.cz
SCOPUS

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Dr. Stanislava Debnárová

long-term stay at Université de Mons, Belgium

debnarova(at)mail.muni.cz
ORCID

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Dr. Štěpánka Kelarová

Maternity leave

kelarova.s(at)mail.muni.cz
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Ph.D. students

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Sahand Behrangi

Industrial deposition and characterization of ternary nitride thin films

behrangi(at)mail.muni.cz

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Martin Ondryáš

Understaning of multiplused HiPIMS process, preparation and cahracterization of deposited thin films

484247(at)mail.muni.cz

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Roman Přibyl

Development of multifunctional thin films deposition technology by PECVD

romanpribyl(at)mail.muni.cz

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Tomáš Rada

Industrial deposition of thin films under the high ionization of sputtered particles

t.rada(at)mail.muni.cz

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Martin Učík

Deposition process using pulsed arc synchronized with substrate bias during deposition of hard AlTiN and AlCrN coatings

540833(at)mail.muni.cz

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Richard Václavik

Research of nanostructured plazma-polymer thin films deposited in dusty plasma

451769(at)mail.muni.cz

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Lukáš Vrána

Research of nitrides stabilized by high enthropy prepared by magnetron sputtering

lvrana(at)mail.muni.cz

Want to join our research? Contact us. We collaborate with scientific organizations from all over the world and with companies focusing on PVD technologies. Applications of our coatings and nanomaterials include:

  • mechanical protective coatings – mechanical engineering
  • flexible electronics
  • optoelectronics
  • aerospace and automotive
  • hydrogen and electrical energy storage
  • sensors

PECVD methods and analysis of mechanical properties

PECVD methods and analysis of mechanical properties

Assoc. Prof. Vilma Buršíková

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