Department of Plasma Physics and Technology
Equipment and services
The Department of Plasma Physics and Technology is equipped with many specialized instruments. A list of the most important devices can be found below on this page. We also offer our scientific facilities and equipment for research and analysis to other scientific organizations and private companies. We participate in joint projects. Do you have a problem that you cannot solve? One of our technological innovations might be the right solution. Feel free to contact us via Open Access or a form at CEPLANT.
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Diffuse Coplanar Surface Barrier Discharge
DCSBD
DCSBD technology creates a thin layer of macroscopically uniform, high-density atmospheric plasma. Successful tests and industrial applications prove the unique properties of DCSBD plasma technology, which clearly distinguish it from other plasma technologies.
DCSBD features:
- atmospheric plasma, no vacuum systems needed
- ignites in ambient air, but can also be generated in any reactive gas mixture (including hydrogen)
- DCSBD unit is mechanically robust and the generated plasma is safe
- cold plasma is gentle on heat-sensitive materials
- meets the requirements of a fast in-line production in the textile and paper industry as well as roll-to-roll
- scalable (from laboratory to large-scale applications)
- optically homogeneous plasma
- the thin diffusion layer of DCSBD plasma reaches a power density of 100 W/cm3
Applications:
- activation and cleaning of surfaces (glass, paper, wood, natural materials, metals, semiconductors, polymers – PS, PES, PET, PP, PTFE, PPTA, ...)
- applicable to planar, curved and 3D surfaces (fabrics, fibers, medical catheters, seeds and grains, powders, ...)
- surface wetting treatment
- decontamination, sterilization
- thin films – plasma-assisted deposition of thin films and plasma functionalization of coatings
- generation of ozone and active particles
- plasma etching of polymers, selective etching of composite materials
- plasma-initiated rapid reduction of graphene oxide
- applicable in a plethora of industries, from textiles, paper, glass and food to agricultural and medical applications
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Plasma system with 25 DCSBD units
Developed at the Department of Plasma Physics and Technology, the plasma system called Avatar is used for large-scale roll-to-roll applications. It is based on DCSBD technology and is a pilot line for surface treatment of nonwoven textiles. This plasma system contains 25 DCSBD plasma units operating at atmospheric pressure in the air. The system is fully automatic and capable of continuous industrial operation.
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Plasma system with curved electrode
Developed at the Department of Plasma Physics and Technology, the plasma system with curved electrodes uses DCSBD plasma technology for large-scale roll-to-roll applications. This system is equipped with two DCSBD plasma units for double-sided treatment in ambient air. Both DCSBD units have a curved geometry for use in roll-to-roll applications. This equipment has been developed for large-area plasma pretreatment of flexible materials such as PET, PEN, and paper. The system can also be used for plasma production of nanostructured functional coatings in flexible and printed electronics.
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Equipment for the continuous treatment of flexible substrates by atmospheric pressure plasma generated in various gaseous atmospheres
This device, developed at the Department of Plasma Physics and Technology, is suitable for the continuous treatment of flexible substrates by plasma generated at atmospheric pressure in various working gases. It is designed to treat thin and flexible samples up to 200 mm in width by plasma generated by diffusion coplanar surface barrier discharge. The closed reactor chamber allows the generation of low-temperature non-isothermal plasmas in all types of common industrial gases. The system is equipped with two concave curved DSCBD plasma units with automatic control of power and rewind speed of flexible films.
The unique design of the working gas supply for the plasma generation also allows working in pure hydrogen or mixtures thereof. The sample unwinding speed is adjustable from 0.27 to 32 cm/s. This corresponds to a plasma treatment time of 0.3 - 30 s when using one electrode or max. 60 s for two electrodes. This device was developed through the project TAČR TJ01000327 and company ROPLASS s.r.o.
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Minor plasma system for flexible material processing
This device, developed at the Department of Plasma Physics and Technology, utilizes a smaller plasma system with a curved DCSBD unit to treat a variety of flexible surfaces. The system can be used for flexible samples ranging in size from a few cm2 to A4. The concave curved DCSBD unit is placed in close proximity to the treated surface, which can be mounted on a 296 mm diameter dielectric cylinder with a curvature of 1/14.8 cm-1.
This system can prepare materials for various applications such as photovoltaics, light emitting devices, and/or sensing systems on lightweight and low-cost substrates.
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Air pillow
The DCSBD plasma technology unit called Air Pillow is a unique plasma device for the treatment of glass surfaces that was developed at the Department of Plasma Physics and Technology. This plasma system is capable of manual and inline treatment of large glass surfaces. An air bearings system controls the distance between the DCSBD plasma source and the glass surface.
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Plasma system for the treatment of planar materials
The plasma system for the treatment of non-flexible materials was developed at the Department of Plasma Physics and Technology and uses DCSBD technology. The equipment can treat samples up to A4 size for various applications related to the functionalization of polymer, glass and metal surfaces. This system is also capable of processing wood and non-woven textiles.
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Commercially available plasma sources
Smaller commercially available devices
- industrial corona – suitable for material treatment in roll-to-roll applications
- solution for planar and 3D objects
- Glider Arc and Plasma Beam from Diener electronic
- portable Glide Arc from Ahlbrant, now Baldwin company
- plasma multijet
- plasma pencil
- plazma jet with slit nozzle
- ULD 60 Plasma Curtain from ACXYS Plasma Technologies
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Small plasmas systems based on multihollow MSDBD
They extend the capabilities of conventional DCSBD plasma technology, which is limited to plasma generation at a very small distance from the dielectric barrier surface. The possibility of blowing through the dielectric barrier of the MSDBD plasma unit with working gas increases the effective distance for material treatment up to several millimeters (compared to the effective distance of DCSBD plasma of 0.3 mm). MSDBD plasma can be generated in various working gases (air, N2, O2, CO2, H2) and in mixtures of working gas with water vapor or pure water vapor.
The technology is suitable for generating ozone, plasma-activated water vapor, and active particles for material surface treatment and thin film modification.
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Magnetron deposition chambers
Vinci Technologies PVD 50S
This device is a custom-built vacuum deposition system from Vinci Technologies for thin film preparation. Up to 5 targets can be placed in the chamber simultaneously to serve as a source of sputtering material. The targets can be metal, composite or ceramic and are 3 inches in diameter. It uses DC, pulsed, HiPIMS and RF voltage sources to ignite the plasma. The device is equipped with a transition chamber, called a load-lock, which allows samples to be inserted into the chamber without disturbing the vacuum. The 6-inch diameter substrate holder can be rotated, biased, and heated to 750°C. The device is equipped with a MOS system that allows real-time in-situ monitoring of stress in the growing layer.
Applications:
- oxides, nitrides, hydrides or carbides with various stoichiometry
- research of mettalic glasses
- hard protective coatings
- nanocomposites thin films
- antibacterial coatings
Person of interest: doc. Mgr. Pavel Souček, Ph.D. soucek(at)mail.muni.cz
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HVM Flexilab
Two versatile laboratory vacuum deposition systems from HVM Plasma are used to prepare layers from up to three targets simultaneously. The targets can be metal, composite or ceramic and are 2 inches in diameter. It uses DC, pulsed, HiPIMS and RF voltage sources to ignite the plasma. The substrate holder can be rotated, biased, and heated to 700°C. Its compact size makes it extremely suitable for experimental research and offers a wide range of selectable deposition parameters.
Applications:
- oxides, carbides, nitrides of various stoichiometry
- research of High Entropy Alloys
- dielectric layers
- hard protective coatings
Person of interest: doc. Mgr. Pavel Souček, Ph.D. soucek(at)mail.muni.cz
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Alcatel SCM 650
The Alcatel SCM 650 semi-industrial vacuum deposition device is used for deposition process diagnostics and thin film preparation. The system can be equipped with three types of planar magnetron heads (circular with a diameter of 7.5 cm and 20 cm and rectangular with dimensions of 7.6 cm x 25 cm). The targets can be metal, composite or ceramic. It uses DC, pulsed, HiPIMS and RF voltage sources to ignite the plasma. The substrate holder can be rotated, biased, and heated. The system is mainly used for plasma diagnostics.
Applications:
- measurement of plasma parameters (OES, probes, QCM, fast ICCD camera, RFEA)
- diagnostics of deposition parameters
- monitoring of plasma instabilities
- hard protective coatings
Person of interest: doc. Mgr. Pavel Souček, Ph.D. soucek(at)mail.muni.cz
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Naprašovačka Quorum
Q150RES from Quorum Technologies is small coating device for deposition of thin metallic layer over non-conductive samples before SEM (scanning electron microscopy) analysis. It can utilize electirc arc (e.g. C) or magnetron sputtering (Pt, Au, Ir). Its small size suits quick and easy sample preparation.
Person of interest: Mgr. Jana Jurmanová, PhD. janar(at)physics.muni.cz
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Capacitively coupled deposition chambers
PECVD reactor R1
A reactor called R1 is a device developed at the Department of Plasma Physics and Technology. The reactor chamber is made of glass, which allows optical monitoring of the discharge. Its transparency makes the reactor suitable for the presentation of capacitively coupled discharges. The chamber is used for plasma chemical deposition from the gas phase (PECVD). The discharge is ignited by an RF generator at 13.56 MHz. The operating pressure is typically 15-20 Pa. The device is suitable for deposition at low temperatures.
Applications:
- research and development of flexible polymer substrates
- deposition of organosilicon layers, e.g. SiOxCyHz(N)
- depozition of DLC doped with various elements (Si, O2, Ag)
Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz
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Deposition reactor GEC
The GEC reactor is an all-metal ultra-high vacuum (UHV) reactor. It is used for the deposition of thin films from the gas phase (CVD and PECVD). The discharge is ignited by an RF generator up to 300 W. The device allows independently controllable bias (bias up to -600V).
Applications:
- development of thin films of various composition
- deposition of thin DLC films doped with Cu for bioapplications
Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz
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PECVD reactor R4
The R4 reactor is a device developed at the Department of Plasma Physics and Technology in 2022 through the MATCA subproject with Vacuum servis company. It is a high-capacity deposition device suitable for industrial applications, enabling the coating of large samples. The equipment is built from the original R2 reactor. It is suitable for plasma-enhanced chemical deposition of thin films from the gas phase (PECVD). The limiting pressure of the apparatus is 10-4 Pa. The plasma can be ignited by DC or RF (13,56 MHz or 27,12 MHz). The power delivered to the plasma is up to 600 W. Depositions can be performed at low temperatures.
Application:
- deposition of diamond like layers
- coating of thermally sensitive materials (protective coatings for plastic parts)
- coating of metallic meshes for water filters (anticorrosive properties)
Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz
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Microwave deposition chambers
Microwave torch at atmospheric pressure
A plasma microwave torch is a microwave discharge in the form of a filament or flame at atmospheric pressure with a single or dual-channel nozzle excited in argon. The discharge can be operated in a closed reactor or open environment depending on the precursor used - hydrocarbons, alcohols, and organometallic precursors with reactive hydrogen, oxygen, or nitrogen. The device can be used for the deposition of nanomaterials or thin films on a discharge-heated substrate (200-1000 °C) or in the form of powder collected from the walls of the apparatus or filters.
Applications:
- synthesis of inorganic nanoparticles
- synthesis of carbon nanomaterials – nanoparticles, nanotubes and graphene, diamond-like materials
- plasma conversion fo organic materials
- study of filaments self-organization and plasma chemical proceses in microwave plasmas
- study of plasma interaction with surfaces and nanomaterials
Person of interest: Mgr. Ondřej Jašek, Ph.D. jasek(at)monoceros.physics.muni.cz
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Surfatron and Surfaguide
Surfaguide and Surfatron are microwave discharges with a surface wave. They operate in argon at low and atmospheric pressure with the possible addition of gaseous reactants for nanomaterial synthesis and surface modification. Each device has a different type of geometry, extending the possibility of using the discharge for various applications.
Applications:
- synthesis of nanomaterials on substrates (carbon nanotubes, graphene)
- deposition of thin films by CVD
- diagnostics of microwave plasmas
Person of interest: Mgr. Ondřej Jašek, Ph.D. jasek(at)monoceros.physics.muni.cz
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Other deposition devices
Laboratory reactor for thin film preparation
The laboratory PVD reactor for the preparation of thin films was developed at the Department of Plasma Physics and Technology. It allows coating various substrates, both electrical and dielectric. The reactor chamber has a holder for two evaporated elements and is equipped with an electron gun. An oscillating crystal is mounted in the reactor to allow in-situ measurement of the growing layer thickness.
Applications:
- conductive contacts
- protective layers
- optical films, semitransparent mirrors
Person of interest: doc. Mgr. Pavel Slavíček, Ph.D. ps94(at)physics.muni.cz
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Annealing furnace
The high-temperature furnace is used for the annealing of samples and chemical vapor deposition. The high-temperature cylindrical furnace can operate from 30°C to 1 050°C with defined heating rates and possible rapid heating and cooling of samples. The sample compartment consists of a quartz tube with an inner diameter of 45 mm. It can be operated at low to atmospheric pressure in the desired gas mixture for various sample annealing or (PE)CVD deposition processes on substrates
Applications:
- annealing, reduction or oxidation of substrates, nanomaterials or powders in control atmosphere
Person of interest: Mgr. Ondřej Jašek, Ph.D. jasek(at)monoceros.physics.muni.cz
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NanoSpider
NanoSpider NS LAB 500 from ELMARCO is a device for the preparation of nanofibres by needle-free electrospinning. This equipment is part of a roll-to-roll experimental line. The electrospun electrode can have a width of up to 350 mm, and the unwinding speed is up to 5 000 mm/min. Nanofibers can be deposited on different types of unwound substrates, e.g. polymer, in large quantities. The device is used in the research of preparation and production of nanofibres used in filtration membranes suitable for liquids and air.
Person of interest: RNDr. Zlata Kelar Tučeková, PhD. zlata.tucekova(at)mail.muni.cz
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Electrospinning
Zařízení pro technologii elektrostatického zvlákňování používá vysokonapěťový zdroj Spellman SL150 a stříkačkovou pumpu NE-1000 firmy New Era Pump System, Inc.The device for the electrospinning technology uses a Spellman SL150 high-voltage power supply and a NE-1000 syringe pump from New Era Pump System, Inc. The syringe pump maintains a constant discharge of electrospun material from 0.73 µL/hr to 2,100 mL/hr, depending on the syringe type. The device is fully automatic and programmable. This technology is used to produce nanofibers for research and development of, for example, nanofiber filters.
Person of interest: RNDr. Zlata Kelar Tučeková, PhD. zlata.tucekova(at)mail.muni.cz
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Vacuum spray chamber
A vacuum spray chamber is a device that allows the spraying of layers under reduced pressure in a chamber with a horizontally controllable linearly shaped pneumatic spray nozzle. A PC fully controls the spraying process and nozzle movement. The heated substrate pad allows heating up to 100°C. The device enables the spraying of layers from stock solutions of aqueous suspensions containing solvents. This chamber was developed within the framework of the PoC sub-project TP01010039 and is used for the production of thin GO papers of A4 size.
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Pulsed pikosecond laser
The Ekspla pulsed picosecond laser system has a tunable wavelength range of 193 - 2300 nm. The system includes the PL2231-50-TRAIN Nd:YAG pulsed laser with the H400-APL2100-TRAIN amplification unit and harmonic generators and the PG411-SH-DUV optical parametric amplifier. The system produces 30 ps pulses at a frequency of 50 Hz. The energy of each pulse reaches tens of µJ in the UV region, hundreds of µJ for visible and IR radiation and 30 µJ for the 1064 nm primary beam.
Applications:
- detection of reactive particles in plasma using LIF and TALIF
- mapping of time and space propagation of absolute concentration of reactive particles
- measurement of local electric field in plasma using Electric field-induced second harmonic generation (EFISH) method
Person of interest: doc. Mgr. Pavel Dvořák, Ph.D. pdvorak(at)physics.muni.cz
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Pulsed nanosecond laser
The laser system produces short pulses (10 ns) with wavelengths in the range of 204 - 1500 nm with a repetition rate of 30 Hz. It consists of a Quanta-Ray PRO-270-30 pulsed Nd:YAG pump laser, a Sirah PrecisionScan PRSC-D-24-EG dye laser and a higher harmonic frequency generator. The system is capable of operating with discharges at atmospheric pressure and in other reactive atmospheres.
Applications:
- detection of reactive particles in plasma using LIF and TALIF
- mapping of time and space propagation of absolute concentration of reactive particles
- measurement of radicals and metastables concentration (e.g. H, N, O, OH, Sn, Pb)
- study of the mean life expectancy of active particles
Person of interest: doc. Mgr. Pavel Dvořák, Ph.D. pdvorak(at)physics.muni.cz
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Reactor for low-pressure capacitively coupled discharge
The device, called Temelín, was manufactured at the Department of Plasma Physics and Technology. It is a low-pressure reactor for capacitively coupled discharges. Temelín has many diagnostic components: a Langmuir probe, a mass spectrometer with an energy analyzer, an optical emission spectrometer, and oscillators for measuring higher harmonic frequencies. The operating pressure of the chamber is from 0.1 Pa to 1 kPa.
Applications:
- study of plasma processes
- monitoring of thin film etching
- measurement of concentration of reactive particles (radicals, metastables)
- study of non-linear electric plasma characteristics
Person of interest: doc. Mgr. Pavel Dvořák, Ph.D. pdvorak(at)physics.muni.cz
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Optical spectrometers
The optical spectrometer is used to determine the composition of plasmas, to determine vibrational/rotational temperatures, or to measure particle concentrations. The Department of Plasma Physics and Technology has two large and three smaller portable spectrometers.
- The Shamrock 750 from English manufacturer Andor is in a Czerny-Turner configuration with a focal length of 750 mm. The spectral range is 200 to 1000 nm. The device has three gratings (600, 1200, and 2400 apertures/mm). The spectral resolution is 0.04 nm*w/10 µm slit.
- The FHR1000 from Horiba is also available in a Czerny-Turner configuration with a focal length of 1000 mm. The spectral range is 200 to 750 nm. The device has two gratings (2400 and 3600 apertures/mm). The spectral resolution is 0.01 nm*w/10 µm slit.
- The AvaSpec-ULS-TEC portable spectrometers from Dutch company Avantes are suitable for fast and accurate radiation analysis over a wide range:
- spectral range 200 - 1000 nm, slit width: 25 µm, grating: 300 vrypů/mm
- spectral range 290 - 395 nm, slit width: 10 µm, grating: 2400 vrypů/mm
- spectral range 740 - 924 nm, slit width: 25 µm, grating: 1200 vrypů/mm
Person of interest: doc. Mgr. Pavel Slavíček, Ph.D. ps94(at)physics.muni.cz
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ICCD cameras
The Department of Plasma Physics and Technology has three ICCD cameras: PIMAX 2, 3, 4 from Princeton Instruments. They can capture very fast (up to 500 ps) and weak (low intensity) events. Princeton Instruments.
Applications:
- study of plasma elementary processes
- study of instabilites of deposition plasmas
- measurement of LIF a TALIF
Person of interest: doc. Mgr. Pavel Dvořák, Ph.D. pdvorak(at)physics.muni.cz
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Time-correlated photon counting
The Simple-Tau 152 from Becker&Hickl is capable of time-correlated single photon counting (TCSPC) in two independent paths. This technology enables the recording of very weak optical signals with a high sampling rate of up to 7 ps and a resolution of up to 60 ps. The correlation time is in the range of 50 ns to 5 µs. The device is equipped with three fast PMC-100 photomultiplier tubes sensitive in the region from 185 nm to 820 nm.
Applications:
- plasma diagnostics and study of atmospheric discharges in gases
- study of RF discharge ignition
- measurement of electric field development
Person of interest: doc. Mgr. Zdeněk Navrátil, Ph.D. zdenek(at)mail.muni.cz
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Photomultipliers, electrical probes and oscilloscopes
The Department of Plasma Physics and Technology also has smaller devices for plasma and discharge diagnostics. Among the photodetectors used is the PMT210 photomultiplier from Photek with parameters - rise time 90 ps and FWHM 135 ps. It can be used for time-resolved optical emission and laser spectroscopy. The department has commercial and self-assembled electrical probes with time resolution up to hundreds of ps with high sensitivity. Among the equipment are modern oscilloscopes with high bandwidth, high sampling rate, and wide dynamic range. They allow the processing and analysis of large amounts of data. Among our oscilloscopes is the DSO-S204A from Keysight Technologies with a bandwidth up to 6 GHz.
Person of interest: doc. Mgr. Tomáš Hoder, Ph.D. hoder(at)physics.muni.cz
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Software
The Plasma Diagnostics and Modelling DPPT research group developed several software programs suitable for the analysis of diagnostic measurements:
- MassiveOES for molecular spectra analysis
- Spectrum Analyzer for atomic spectra analysis
- EBFFit for measurement of the concentration of metal's ground states using self-absorption
Person of interest: doc. Mgr. Zdeněk Navrátil, Ph.D. zdenek(at)mail.muni.cz
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Quartz Crystal Microbalance
Quartz Crystal Microbalance (QCM) from English company Kurt J. Lesker is used to determine the flux of neutral or ionized particles towards the sample during a deposition process. Using this data, the deposition rate can be monitored even during deposition. The depth resolution is ± 0.037 Å. It can operate with and without a grid.
Person of interest: Mgr. Peter Klein, Ph.D. pklein(at)mail.muni.cz
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RFEA
Semion RFEA (Retarding Field Energy Analyser) from Irish manufacturer Impedans Plasma Measurement is a device for the measurement of the ion flux and energy distribution function of ions arriving to the surface of a growing thin film in real-time using a sample simulation with an integrated sensor. This diagnostic system gives accurate information relevant to the in-situ properties of deposited thin films. The system is compatible with the following power supplies: dc, p-dc, RF, p-RF, microwave, and HiPIMS. The time resolution is 1 µs, and the energy resolution is 1 eV. The maximum operating temperature is 150°C.
Person of interest: Mgr. Peter Klein, Ph.D. pklein(at)mail.muni.cz
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Vector network analyzer
R&S®ZVL vector network analyzer from Rohde&Schwarz is a device that combines the functions of a network analyzer, spectrum analyzer, and power meter in one instrument. It measures the S-parameter (scattering matrix) of a double gate. The device operates in the 9 kHz - 15 GHz range. It is an indispensable tool for analyzing high-frequency and high-speed circuits, cables, and couplers. It is used for the measurements of frequency dependencies of voltage and current probes (e.g., for DBD discharge measurements even in time scales of hundreds of ps).
Person of interest: prof. Mgr. Vít Kudrle, Ph.D. kudrle(at)sci.muni.cz
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XPS – X-ray photoelectron spectroscopy
ESCALAB 250Xi from Thermo Fisher Scientific is an extremely powerful XPS spectrometer combining high sensitivity with high-resolution quantitative imaging. This system is a multi-technological device designed to analyze the chemical composition and surface condition of solids. It allows qualitative and quantitative detection of all elements (except H and He). It provides information on the spatial and depth distribution of elements. It analyses the chemical state of the sample, including binding and oxidation states. It determines sorption capacity and reactions (adsorption, ion exchange, etc.). The energy resolution of the instrument is FWHM ≤ 0.45 eV Ag 3d5/2 peak, and the spatial resolution is below 20 µm. ESCALAB can handle 2D imaging and mapping as well as depth profiling. The instrument is also capable of operating in UV mode (Ultraviolet Photoelectron Spectroscopy), as REELS (Reflection Electron Energy Loss Spectroscopy), and as ISS (Ion Scattering Spectroscopy).
Applications:
- polymers, glass, ceramics
- semiconductors, dielectrics and magnetic materials
- research of nanomaterials, biotechnology and a plethora of industries
Person of interest: RNDr. Monika Stupavská, PhD. stupavska(at)mail.muni.cz
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SIMS – Secondary ion mass spectrometry
SurfaceSeer –I from KORE Technology is a highly sensitive surface-analysis spectrometer. The SIMS technology uses ions bombarding the surface of the sample. The mass spectrometer detects the samples's sputtered secondary ions. It can determine the elemental, isotopic, or molecular composition of the surface. The composition obtained corresponds to 1 to 2 nm of the top layer of the sample material. The SurfaceSeer -I can operate in static mode with minimal destruction of the sample surface. It is suitable for mass spectra and 2D spectral imaging. The second mode, the so-called deep mode, is used for elemental composition determination in deeper layers and, in many cases, for molecular analysis. The device is highly sensitive (detection of 109 atoms/cm2) and can work with both positive and negative SIMS (word tracking). The mass resolution is >3000 M/ΔM with a range of >1000 m/z.
Applications:
- polymers, glass, ceramics
- semiconductors, magnetic materials and dielectrics
- biotechnology and industry
Person of interest: RNDr. Monika Stupavská, PhD. stupavska(at)mail.muni.cz
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MALDI – Matrix-assisted laser desorption/ionization
The AXIMA Resonance from Shimadzu s a versatile MALDI mass spectrometer with a time-of-flight (TOF) detector. An N2 laser (337 nm) with a variable repetition rate is used for sample desorption. A quadrupole ion trap allows the selection of parent ions with high resolution and high sensitivity. TOF in the reflection mode increases the sensitivity and accuracy for all measured ions. The device can detect both positive and negative ions in the mass range of 100 to 20,000 Daltons. The maximum sample thickness is 0.5 mm.
Applications:
- analysis of small molecules – organic and inorganic
- structural characterization and identification of synthetic polymers
- structural characterization and sequencing of biomolecules (peptides, proteins, etc.)
- purity analyses of materials (medical drugs, glass, metals, polymers)
Person of interest: RNDr. Monika Stupavská, PhD. stupavska(at)mail.muni.cz
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Raman spektroscopy
The LabRAM HR Evolution Raman spectrometer from Horiba Scientific is used for the structural analysis of samples. It measures the vibrational, rotational, and total low-energy modes of molecules. The spectrometer with a focal length of 800 mm is equipped with three excitation lasers: UV - 325 nm, VIS - 532 nm, and NIR - 785 nm. The spectrometer has 10x, 50x, 100x objectives and a 74x achromatic UV objective. The spectral range is from 10 to 2 200 cm-1. The instrument allows 2D and 3D pattern mapping. Due to the high resolution and low noise, accurate information on crystallinity, polymorphism and overall state of surface molecules can be obtained.
Applications:
- study of the thin films
- DLC graphitization
Person of interest: doc. Mgr. Pavel Souček, Ph.D. soucek(at)mail.muni.cz
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EDX – Energy-dispersive X-ray spectroscopy
The X-MAX50 is an extension of our SEM Mira3 scanning electron microscope. The EDX (Energy-dispersive X-ray spectroscopy) allows the chemical composition of the individual elements in the sample to be determined.
Person of interest: Mgr. Jana Jurmanová, Ph.D. janar(at)physics.muni.cz
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SEM – Scanning electrone microscope
The MIRA3 scanning electron microscope from TESCAN GROUP, a.s. is a PC-controlled microscope equipped with a Schottky field emission electron gun designed for high vacuum or variable pressure. It has a SE (secondary electron) and a BSE (backscattered electron) detector. Both detectors are also housed in the lens objective (TTL detectors), allowing for very short working distances with high resolution. The Beam Deceleration Mode (BDM) allows for a higher contrast display of fine details on the sample surface. The maximum resolution is 1 nm at 30kV, and the magnification range is from 2x to 1,000,000x.
Several expansion elements are mounted on the device. The EDX (Energy Dispersive X-ray Spectroscopy) detector allows the analysis of the elemental composition of the material surface. The WDS (Wavelength Dispersive Spectroscopy) detector can refine the previous analysis and detect even significantly lower elemental concentrations. The EBIC (Electron Beam Induced Current) detector records the charge distribution on the surface of semiconductors and dielectrics. The STEM (Scanning Transmission Electron Microscopy) detector allows the viewing of suitable samples (nanoparticles, thin films down to tens of nanometers) for bright field (BF) and dark field (DF) transmission.
Applications:
- material's surface composition and mapping
- analysis of composition and mapping for art restoration
- search for surface defects - dirt, foreign coatings
- searching for defects in cracks or fractures - errors in the sample structure (micro cavities, poor quality fillers, chemically foreign particles...)
- imaging of sensitive samples - polymers, biological preparations, thin films, nanoparticles, ...
- monitoring of structural and chemical changes after plasma treatment
- analyses to determine the causes of faults on various equipment
Person of interest: Mgr. Jana Jurmanová, Ph.D. janar(at)physics.muni.cz
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AFM – Atomic force microscopy
Ntegra Prima from NT-MDT is a modular atomic force microscope that allows the use of different scanners for a wide range of applications. The system has low thermal drift and excellent thermal stability, which plays a vital role in applications where high precision of long-term positioning is required due to long-term experiments, as well as in nanomanipulation, electro-corrosion experiments, nanolithography, etc. The instrument can scan in the following modes: contact, non-contact, lateral force, phase imaging, and force curves. The scanning range is 100x100x12 mm with a sensitivity better than 2 μm.
Applications:
- three-dimensional surface imaging
- surface relief analysis
- roughness measurement
Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz
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Confocal microscope
The Olympus OLS 4000 LEXT is a laser confocal microscope that can capture high-resolution 3D images. It works by sequentially imaging a sample between two heights and then recombining it to produce images and a 3D projection of the surface that can be quantified. Its specially developed lenses produce high-quality images of the sample. Different imaging methods can be used: BF/DIC/Laser/Laser Confocal DIC. The source is a 405 nm semiconductor laser. The magnification range is from 108x to 17 280x. Lenses available are 5x, 10x, 20x, 50x, 100x. Optical magnification is 1x to 8x with an imaging field size of 2560x2560 - 16x16 µm.
Applications:
- measurement of the roughness of profiles
- measurement of dimensions of surface reliefs, patterns, defects, etc.
- area measurement of surface formations
Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz
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Profilometer
DektakXT is a 3D profilometer from Bruker. This stylus profilometer is for advanced analysis and measurement of surfaces at the nanometer level. The measurement is contact-based and allows both 2D and 3D surface analysis. The stylus sensor is a LIS3 (Low Inertia Sensor) with a strength from 1 to 15 mg. The device has multiple stylus types. The maximum sample thickness is 50 mm, and the maximum sample size is 20 cm.
Applications:
- measurement of sample roughness.
- measurment of the thickness of layers on a step
- measurement of thin film stress from substrate curvature
Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz
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Nanoindentor
Triboindenter Hysitron Ti 980 from Bruker is an advanced nanoindenter for high-precision analysis of the mechanical and tribological properties of material surfaces. The instrument can operate in quasi-static indentation, scratch-testing, nanowear, and SPM imaging modes. The nanoindenter has Berkovich-type tips. The tip load ranges from ≤30 nN to 10 N (dual-head system) with a depth resolution of <0.02 nm (noise level <0.2 nm). The maximum indent depth is >5 µm.
Aplikace:
- research on hard protective coatings
- study of DLC and diamond-like coatings
- research on nanohardness of materials
Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz
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Scratch tester
The REVETEST Xpress plus scratch tester from Swiss company CSM Instruments, now American company Anton Paar, is used for comprehensive analysis and characterization of the mechanical properties of thin film-substrate systems. In combination with other instruments, it is used to test adhesion and fracture toughness. The device can operate in several modes: constant, progressive, and incremental loading. The load size ranges from 0.5 N to 200 N, with a maximum specimen size of 300 mm.
Applications:
- adhesion quantification
- evaluation of friction and deformation
- cyclic and matrix tests for comprehensive wear studies
Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz
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Tear tester
The AGS-5knX tear tester from Shimadzu allows an uniaxial tensile testing of the mechanical properties of materials. By defined stressing of materials with automatic sensoring system, their tention and adhesion can be studied. This programmable device enables both tensile and tear tests. The force range is up to a maximum of 10 kN. The instrument is equipped with two dynamometers of 100 N and 5 kN. Loading is done directly by a high-precision constant speed control method via a backlash-free ball screw drive. The sliding speed is adjustable from 0.001 to 1000 mm/min.
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Trhačka SM
Multifunctional surface properties measurement device TA.XTplusC Texture Analyser TA50/900E from Stable Microsystems is used for the measurement of adhesion forces and mechanical characteristics of various materials. Strain gauges with capacities up to 50 kg and 500 g are available for high-resolution measurements. In addition to the standard clamps for testing the mechanical properties of materials, the device is equipped with the following modules:
- a module for measuring adhesion forces at 90° angles
- a module for measuring adhesion forces at 180° angles
- a module for measuring the coefficient of friction according to ASTM 1894-90
- metal clamping base with three-point bending measurement kit
- set of spherical and planar probes for mechanical testing of materials
- relay control unit for communication with external measuring devices
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Ellipsometry
The Department of Plasma Physics and Technology has three ellipsometers covering a wide spectral range. Ellipsometry is an optical method of analyzing the dielectric properties (complex refractive index or dielectric function) of thin films. It measures the change in polarisation of light after interaction with a sample and compares it with a model. It can be used to characterize structure, roughness, thickness, homogeneity, uniformity, crystalline nature, electrical conductivity, and other material properties and defects.
- Horiba Jobin Yvon UVISEL
- spectral range: 0.6 eV - 6.5 eV, incidence angles 55° - 90°
- Woollam IR-VASE
- spectral range: 300 cm-1 - 6 500 cm-1, incidence angles 25° - 90°
- Horiba Jobin Yvon UVISEL2 VUV
- spectral range: 0.6 eV - 8.5 eV, fixed angle of incidence 70°
- measurement in vacuum and the possibility of sample heating
Aplikace:
- reflection and transmission mode measurements (UVISEL and IR-VASE)
- determination of optical properties of thin films, characterization of defects (roughness, inhomogeneity, non-uniformity)
- suitable for thin film samples and liquids
Person of interest: Mgr. Daniel Franta, Ph.D. franta(at)physics.muni.cz
- Horiba Jobin Yvon UVISEL
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Spectrophotometry
The Department of Plasma Physics and Technology has two spectrophotometers. Spectrophotometry is an optical method that measures the change in light intensity after interaction with a sample (reflection, transmission).
- Perkin Elmer Lambda 1050
- spectral range 0.38 eV - 6.6 eV
- possibility to measure in transmission and reflection mode
- dual-beam monochromator for high spectral resolution
- Bruker Vertex 80v
- holder for perpendicular transmittance measurements
- FTIR
- reflective extension for 7° angle of incidence
- measurement in vacuum
- vibration mode measurement
Applications:
- measurement of optical properties (transmittance, reflectance, attenuated total reflection – ATR)
- determination of optical properties of thin films, characterization of defects (roughness, inhomogeneity, non-uniformity)
- suitable for thin film samples, liquids, powders and pellets
Person of interest: Mgr. Daniel Franta, Ph.D. franta(at)physics.muni.cz
- Perkin Elmer Lambda 1050
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XRD – X-ray diffractometer
The SmartLab typ F X-ray diffractometer from Japanese manufacturer Rigaku is one of the most powerful and versatile mass-produced instruments. The device is equipped with a closed X-ray source with a copper anode and a vertical theta-theta goniometer with a horizontal sample location with independent movement of the source and detector. The smallest step of the goniometer is 0.0001°, which allows high-resolution measurements. The movement of the goniometer is limited to a wide arc from -3° to 160° (2 theta). The sample can be tilted from -5° to 95°. In-plane measurements with a horizontally attached sample can be made by moving the detector in a plane from -3° to 120°. A 1D detector in Bragg-Bretan configuration and a 0D detector in parallel beam configuration can be used for measurements. This versatile configuration allows both out-of-plane and in-plane diffraction measurements. Adapters for SAXS (small angle scattering mode) and reflectance measurements are also available. Individual diffraction patterns can be obtained, as well as sample mapping. It is possible to perform qualitative and quantitative phase analysis, layer stress analysis, and texture measurements on samples up to 6" in size. Samples in the form of thin films, multilayers, as well as powders, nanoparticles, and bulk materials can be analyzed.
Applications:
- structural and phase analysis of crystalline samples
- analysis of powders, nanoparticles and thin films
- research and development of thin films
- research on X-ray analysis of solids
Person of interest: doc. Mgr. Pavel Souček, Ph.D. soucek(at)physics.muni.cz
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SEE system
SEE system is a device developed by the Masaryk University spin-off company Advex Instruments. Its advantage is measurement simplicity, portability, and overall compactness. It can be used to measure the contact angle of a liquid with a sample and to evaluate the free surface energy of a material.
Applications:
- surface energy research of various materials
- study of the effect of plasma treatments on various materials
Person of interest: Mgr. Jakub Kelar, Ph.D. jakub.kelar(at)mail.muni.cz
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Theta Lite
Theta Lite from Biolin Scientific enables contact angle measurement and subsequent free surface energy evaluation. It is suitable for static and dynamic contact angle measurements and stress measurements of surfaces and liquid boundaries. The device is equipped with an integrated substrate holder and allows automatic droplet delivery. The instrument adds background illumination for better resolution of droplet images. The measuring range is from 0° to 180° and 0.01 mN/m to 2000 mN/m. Measurement accuracy is +- 0.1° and +- 0.01 mN/m.
Aplikace:
- surface energy research of various materials
- study of the effect of plasma treatments on various materials
Person of interest: Mgr. Jakub Kelar, Ph.D. jakub.kelar(at)mail.muni.cz
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Dynamic contact angle
The DSA 30 from the German company Krüss s is a PC-controlled system for fast measurement of static and dynamic contact angles. By measuring the contact angle, important surface parameters, such as the free surface energy, can be determined. The device can use 6 different drop analysis methods. It is equipped with automatic baseline detection and automatic drop delivery. The CCD camera has parameters of 61 fps (780 × 580 px) or 311 fps (780 × 60 px). The contact angle range is from 1° to 180° with a limiting resolution of 0.1°. The measured surface energy range is 0.01 mM/m to 1000 mN/m with a resolution of 0.01 mN/m (in alternative units of mJ/m2).
Applications:
- suitable for a wide range of materials (silicon, glass, polymers, thin films, fibers, etc.)
- study of surfaces and interfacial tension between liquids
Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz
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4-point probe
4-point probe is used for the meaurement of electric resistence and conductivity of layers or bulk materials
Person of interest: doc. RNDr. Tomáš Homola, PhD. tomas.homola(at)mail.muni.cz
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Climate chamber
The Memmert ICH110eco climate chamber is used for long-term sample storage in a controlled atmosphere. The chamber allows samples to be stored in an environment with adjustable temperature and humidity. The temperature setting range is from -10° to +60°C with an accuracy of 0.1°C. Humidity can be adjusted from 10 to 80% with a resolution of 0.5% using a steam generator from an external distilled water source. The volume of the chamber is 108 L. The chamber is also equipped with a UV illuminator and daylighting that can simulate the aging of samples outdoors.
Applications:
- investigation of aging of plasma surface treatment
- controlled storage of experimental samples
Person of interest: RNDr. Zlata Kelar Tučeková, PhD. zlata.tucekova(at)mail.muni.cz
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Annealing furnace
The high-temperature furnace is used for the annealing of samples and chemical vapor deposition. The high-temperature cylindrical furnace can operate from 30°C to 1 050°C with defined heating rates and possible rapid heating and cooling of samples. The sample compartment consists of a quartz tube with an inner diameter of 45 mm. It can be operated at low to atmospheric pressure in the desired gas mixture for various sample annealing or (PE)CVD deposition processes on substrates
Applications:
- annealing, reduction or oxidation of substrates, nanomaterials or powders in control atmosphere
Person of interest: Mgr. Ondřej Jašek, Ph.D. jasek(at)monoceros.physics.muni.cz
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Laboratorní analytické váhy
The Department of Plasma Physics and Technology is equipped with standard analytical balances with anti-vibration tables. The accuracy of measurement is 0.0001g.
Applications:
- research on surface plasma treatment (Washburn method for measuring the absorption and diffusion of liquid into the sample).
- determination of thin film density
Person of interest: doc. Mgr. Pavel Souček, Ph.D. soucek(at)physics.muni.cz
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Seepage meter
The seepage meter is a laboratory device manufactured at the Department of Plasma Physics and Technology that meets the ISO standard for measuring seeping/soaking of porous materials, e.g., textiles.
Person of interest: Mgr. Jakub Kelar, Ph.D. jakub.kelar(at)mail.muni.cz
